silicon dioxide layer in fabrication

dimanche 1 juin 2014

silicon die oxide layer is formed on the surface of silicon wafer by the oxidation process

oxidation process



oxidation method

dry oxidation

wet oxidation



dry oxidation

Si+O2 -.> Sio2



wet oxidation

Si+2H2O -> Sio2+2H2



dry and wet oxidation are the type of thermal oxidation or thermal oxidation is different hings ?

what is post oxidation evaluation ?





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